Method to fabricate uniform tunneling dielectric of embedded flash memory cell

ABSTRACT

The present disclosure relates to a method of forming an embedded flash memory cell that provides for improved performance by providing for a tunnel dielectric layer having a relatively uniform thickness, and an associated apparatus. The method is performed by forming a charge trapping dielectric structure over a logic region, a control gate region, and a select gate region within a substrate. A first charge trapping dielectric etching process is performed to form an opening in the charge trapping dielectric structure over the logic region, and a thermal gate dielectric layer is formed within the opening. A second charge trapping dielectric etching process is performed to remove the charge trapping dielectric structure over the select gate region. Gate electrodes are formed over the thermal gate dielectric layer and the charge trapping dielectric structure remaining after the second charge trapping dielectric etching process.

REFERENCE TO RELATED APPLICATION

This Application claims priority to U.S. Provisional Application No.62/272,195 filed on Dec. 29, 2015, the contents of which is herebyincorporated by reference in its entirety.

BACKGROUND

Embedded memory is electronic memory that is integrated with logicdevices on a common integrated circuit (IC) die or chip. Embedded memoryis able to support operation of the logic devices and is often used withvery-large-scale integration (VLSI) IC dies or chips. The integrationadvantageously improves performance by eliminating interconnectstructures between chips and advantageously reduces manufacturing costsby sharing process steps between the embedded memory and the logicdevices.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1A-1C illustrate some embodiments of an integrated chip comprisingan embedded flash memory cell.

FIG. 2 illustrates a cross-sectional view of some additional embodimentsof an integrated chip comprising an embedded flash memory cell.

FIG. 3 illustrates a cross-sectional view of some additional embodimentsof an integrated chip comprising an embedded flash memory cell.

FIGS. 4A-4B illustrates some additional embodiments of an integratedchip comprising an array of embedded flash memory cells.

FIGS. 5-22 illustrate cross-sectional views of some embodiments of amethod of forming an integrated chip comprising an embedded flash memorycell.

FIG. 23 illustrates some embodiments of a method of forming anintegrated chip comprising an embedded flash memory cell.

FIG. 24 illustrates some additional embodiments of a method of formingan integrated chip comprising an embedded flash memory cell.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

Embedded flash memory cells often comprise a charge trapping dielectricstructure arranged between a control gate and a substrate. The chargetrapping dielectric structure may include a tri-layer structure having atunnel dielectric layer, a charge trapping layer, and a blockingdielectric layer. During fabrication of an embedded flash memory cell,the charge trapping dielectric structure is deposited onto thesubstrate. The control gate is then formed and the charge trappingdielectric structure is subsequently etched to confine the chargetrapping dielectric structure below the control gate. During etching ofthe charge trapping additional structure, sides of the tunnel dielectriclayer may be exposed. Consequently, during subsequent thermal oxidationsteps, oxygen can diffuse into end regions of the tunnel dielectriclayer and cause the end regions of the tunnel dielectric layer to growthicker through lateral oxide encroachment. Such thickening of the endregions forms a tunnel dielectric layer having a non-uniform thickness,which can negatively impact performance (e.g., reduce a size of thevoltage threshold window) of the embedded flash memory cell.

The present disclosure relates to a method of forming an embedded flashmemory cell that provides for improved performance by providing for atunnel dielectric layer having a relatively uniform thickness, and anassociated apparatus. The method is performed by forming a chargetrapping dielectric structure over a logic region, a control gateregion, and a select gate region within a substrate. A first chargetrapping dielectric etching process is performed to form an opening inthe charge trapping dielectric structure over the logic region, and athermal gate dielectric layer is formed within the opening. A secondcharge trapping dielectric etching process is performed to remove thecharge trapping dielectric structure over the select gate region. Gateelectrodes are formed over the thermal gate dielectric layer and thecharge trapping dielectric structure remaining after the second chargetrapping dielectric etching process. Keeping the charge trappingdielectric structure in place over the select gate region during theformation of the thermal gate dielectric layer prevents lateral oxideencroachment on the control gate region and improves performance of theembedded flash memory cell.

FIGS. 1A-1C illustrate some embodiments of an integrated chip having anembedded flash memory cell.

As shown in cross-sectional view 100 of FIG. 1A, the integrated chipcomprises an embedded flash memory cell arranged on a substrate 102. Theembedded flash memory cell includes a control gate 104 and a select gate106. The control gate 104 comprises a control gate electrode 110 alaterally arranged between source/drain regions 108 and verticallyseparated from the substrate 102 by way of a first gate dielectric layer112 a and a charge trapping dielectric structure 114. The select gate106 comprises a select gate electrode 110 b laterally arranged betweensource/drain regions 108 and vertically separated from the substrate 102by a second gate dielectric layer 112 b. In some embodiments, dielectricsidewall spacer structures 116 may be arranged on opposing sides of thecontrol gate 104 and the select gate 106. An inter-level dielectric(ILD) layer 118 is arranged over the substrate 102.

The charge trapping dielectric structure 114 comprises a multi-layerdielectric structure configured to store (i.e., trap) different amountsof charge, which respectively correspond to a data state (e.g.,representing a logical “0” or a logical “1”). The charge trappingdielectric structure 114 comprises a tunnel dielectric layer 114 aarranged onto the substrate 102, a charge trapping dielectric layer 114b arranged onto the tunnel dielectric layer 114 a, and a blockingdielectric layer 114 c arranged onto the charge trapping dielectriclayer 114 b. To read the charge stored in the charge trapping dielectricstructure 114, a bias voltage is applied to the control gate electrode110 a. The stored charge screens an electric field produced by thecontrol gate electrode 110 a, causing the threshold voltage of thecontrol gate 104 to vary. Therefore, depending upon an amount of chargestored in the charge trapping dielectric structure 114, the bias voltagemay cause a channel region underlying the control gate electrode 110 ato conduct, indicating a logical “0” or a logical “1”. To add charges tothe charge trapping dielectric structure 114, the control gate electrode110 a and the select gate electrode 110 b may be biased to promote hotcarrier injection. To remove charge in the charge trapping dielectricstructure 114 the control gate electrode 110 a may be biased with a highvoltage to promote Fowler-Nordheim tunneling (FNT) of the charges out ofthe charge trapping dielectric structure 114.

FIG. 1B illustrates some embodiments of a top-view 120 of the integratedchip of FIG. 1A (FIG. 1A is shown along cross-sectional line A-A′ ofFIG. 1B). As shown in top-view 120, the control gate electrode 110 a andthe select gate electrode 110 b are arranged along a first direction 124between the source/drain regions 108. The source/drain regions 108 areseparated from one another along a second direction 126 by isolationregions 122 (e.g., shallow trench isolation (STI) regions).

FIG. 1C illustrates some embodiments of a cross-sectional view 128 ofthe integrated chip along the second direction 126 (alongcross-sectional line B-B′ of FIG. 1B). As shown in cross-sectional view128, the isolation regions 122 are arranged within the substrate 102 onopposing sides of the source/drain regions 108 within the substrate 102.In some embodiments, the substrate 102 has an upper surface 102 u thatis curved between the isolation regions 122, so that a center of theupper surface 102 u is higher than edges of the upper surface 102 u. Insome embodiments, the isolation regions 122 may comprise a depressedregion 130 that is recessed below the upper surface 102 u and a raisedregion 132 that is elevated above the upper surface 102 u and that islaterally separated from the substrate 102 by the depressed region 130.

The tunnel dielectric layer 114 a has a relatively uniform thicknessthat increases by a small amount as a distance from an isolation region122 decreases. For example, the tunnel dielectric layer 114 a has afirst thickness t₁, a second thickness t₂ less than the first thicknesst₁, and a third thickness t₃ that is less than the second thickness t₂.The thicknesses of the tunnel dielectric layer 114 a may decrease byless than approximately 25% between the first thickness t₁ and the thirdthickness t₃. For example, in some embodiments, the thicknesses of thetunnel dielectric layer 114 a may decrease by a range of betweenapproximately 5% and approximately 25%.

For example, in some embodiments, the thicknesses of the tunneldielectric layer 114 a may change by less than approximately 5 nmbetween the first thickness t₁ and the third thickness t₃ (e.g., thethicknesses of the tunnel dielectric layer 114 a may decrease from afirst thickness t₁ of approximately 20 nm to a third thickness t₃ ofapproximately 15 nm). In other embodiments, the thickness of the tunneldielectric layer 114 a may change by less than 3 nm between the firstthickness t₁ and the third thickness t₃.

The relatively small increase in thickness of the tunnel dielectriclayer 114 a gives the embedded flash memory cell a relatively smallvariation in threshold voltage, thereby improving performance and/orreliability of the embedded flash memory cell.

FIG. 2 illustrates a cross-sectional view of some additional embodimentsof an integrated chip 200 having an embedded flash memory cell.

The integrated chip 200 comprises a memory region 232 and a logic region234. The memory region 232 comprises an embedded flash memory cell(e.g., an embedded SONOS flash memory cell) having a control gate 202and a select gate 204 arranged over a substrate 102 at locations betweensource/drain regions 206. The source/drain regions 206 comprise highlydoped regions having a first doping type (e.g., n-type) disposed withinan upper surface of the substrate 102. In some embodiments, the controlgate 202 is arranged over a control well 208 having a second doping type(e.g., p-type) and the select gate 204 is arranged over a select well210 having the second doping type (e.g., p-type). In some additionalembodiments, the control well 208 and the select well 210 may bearranged within a deep well 212 having the first doping type (e.g.,n-type). In some embodiments, the control gate 202 and the select gate204 may share a source/drain region 206 arranged laterally between thecontrol gate 202 and the select gate 204.

The control gate 202 comprises a control gate electrode 220 a separatedfrom a substrate 102 by a charge trapping dielectric structure 114 andone or more additional gate dielectric layers 216 a and/or 218 a. Theselect gate 204 comprises a select gate electrode 220 b separated fromthe substrate 102 by one or more additional gate dielectric layers 216 band/or 218 b. In some embodiments, the upper surface of the control gateelectrode 220 a is higher than the upper surface of the select gateelectrode 220 b. For example, the upper surface of the control gateelectrode 220 a may be vertically offset from the upper surface of theselect gate electrode 220 b by a distance 221.

In some embodiments, the charge trapping dielectric structure 114 maycomprise an ONO structure. In such embodiments, the tunnel dielectriclayer 114 a may comprise an oxide, the charge trapping dielectric layer114 b may comprise a nitride, and the blocking dielectric layer 114 cmay comprise an oxide. In other embodiments, the charge trappingdielectric structure 114 may comprise an oxide-nano-crystal-oxide (ONCO)structure. In such embodiments, the tunnel dielectric layer 114 a maycomprise an oxide, the charge trapping dielectric layer 114 b maycomprise a layer of crystal nano-dots (e.g., silicon dots), and theblocking dielectric layer 114 c may comprise an oxide.

The logic region 234 comprises a transistor device 236 having a logicgate electrode 220 x vertically separated from a logic well region 238within the substrate 102 by way of a thermal gate dielectric layer 240(i.e., a gate dielectric layer formed by a thermal growth process) andone or more additional gate dielectric layers 216 x and/or 218 x. Thelogic gate electrode 220 x is laterally arranged between source/drainregions 244 within the logic well region 238. In some embodiments, anupper surface of the substrate 102 within the logic region 234 may bevertically depressed by a distance 242 relative to a substantiallyplanar upper surface of the substrate 102 within the embedded memoryregion 302.

Isolation regions 214 may be arranged within the substrate 102 onopposing sides of the embedded flash memory cell. In variousembodiments, the isolation regions 214 may comprise shallow trenchisolation (STI) regions, deep trench isolation (DTI) regions, implantisolation regions, field oxide regions, etc. In some embodiments, asilicide layer 222 may be arranged on the source/drain regions, 206and/or 244. The silicide layer 222 may comprise a nickel silicide, forexample.

In some embodiments, dielectric sidewall spacers may be arranged alongsidewalls of the control gate 202, the select gate 204, and thetransistor device 236. In some embodiments, the dielectric sidewallspacers may comprise first sidewall spacers 224 and second sidewallspacers 226 arranged along outermost sidewalls of the first sidewallspacers 224. In some embodiments, the first sidewall spacers 224 and/orthe second sidewall spacers 226 may comprise a nitride. In otherembodiments, the first sidewall spacers 224 and/or the second sidewallspacers 226 may comprise a high-k dielectric material such as hafniumoxide, hafnium silicon oxide, hafnium aluminum oxide, hafnium tantalumoxide, zirconium silicate, or zirconium oxide, for example.

An inter-level dielectric (ILD) layer 228 is arranged over the substrate102. In some embodiments, the ILD layer 228 may comprise phosphosilicateglass (PSG), for example. Conductive contacts 230 vertically extendthrough the ILD layer 228 to one or more of the source/drain regions,206 and 244, and/or one or more of the gate electrodes 220 a, 220 b,and/or 220 x. The conductive contacts 230 may comprise tungsten, copper,aluminum copper, or some other conductive material.

FIG. 3 illustrates a cross-sectional view of some additional embodimentsof an integrated chip 300 having an embedded flash memory cell.

The integrated chip 300 comprises an embedded memory region 302 and oneor more logic regions 304 a-304 c. The embedded memory region 302comprises an embedded memory device having a control gate region 302 aand a select gate region 302 b. The control gate region 302 a comprisesa control gate 202 having a control gate electrode 220 a separated froma substrate 102 by a charge trapping dielectric structure 114, adual-gate dielectric layer 216 a, and a single-gate dielectric layer 218a. The select gate region 302 b comprises a select gate 204 having aselect gate electrode 220 b separated from the substrate 102 by adual-gate dielectric layer 216 b and a single-gate dielectric layer 218b. Source/drain regions 206 are arranged in an upper surface thesubstrate 102 on opposite sides of the control gate 202 and the selectgate 204.

In some embodiments, the one or more logic regions 304 a-304 c maycomprise a single-gate-dielectric region 304 a having one or moresingle-gate-dielectric transistors 306, a dual-gate-dielectric region304 b having one or more dual-gate-dielectric transistors 312, and/or ahigh voltage region 304 c having one or more high voltage transistors316. In some embodiments, the one or more logic regions 304 a-304 c arelaterally spaced from one another by isolation regions 214. Although theembedded memory region 302 and the one or more logic regions 304 a-304 care illustrated as being laterally adjacent to one another it will beappreciated that in some embodiments, the embedded memory region 302 andthe one or more logic regions 304 a-304 c may be located withindifferent parts of an integrated chip.

The single-gate-dielectric transistor 306 comprises asingle-gate-dielectric electrode 220 c that is vertically separated fromthe substrate 102 by way of a single-gate-dielectric layer 218 c havinga first thickness. In some embodiments, the single-gate-dielectricelectrode 220 c is vertically separated from a single-gate well 308disposed within the substrate 102 and having the second doping type.

The dual-gate-dielectric transistor 312 comprises a dual-gate-dielectricelectrode 220 d that is vertically separated from the substrate 102 byway of a single-gate dielectric layer 218 d and a dual-gate dielectriclayer 216 d. In some embodiments, the dual-gate-dielectric electrode 220d is vertically separated from a dual-gate well 314 disposed within thesubstrate 102 and having the second doping type. The single-gatedielectric layer 218 d and a dual-gate dielectric layer 216 dcollectively have a second thickness, which is configured to provide thedual-gate-dielectric transistor 312 with a higher breakdown voltage thanthe single-gate-dielectric transistor 306.

The high voltage transistor 316 comprises a high voltage gate electrode220 e that is vertically separated from the substrate 102 by way of asingle-gate dielectric layer 218 e, a dual-gate dielectric layer 216 e,and a high voltage gate dielectric layer 318. In some embodiments, thehigh voltage gate electrode 220 e is vertically separated from a highvoltage well 320 disposed within the substrate 102 and having the seconddoping type. The single-gate dielectric layer 218 e, the dual-gatedielectric layer 216 e, and the high voltage gate dielectric layer 318collectively have a third thickness, which is configured to provide thehigh voltage transistor 316 with a higher breakdown voltage than thedual-gate-dielectric transistor 312.

In some embodiments, an upper surface of the substrate 102 within thehigh voltage region 304 c may be vertically depressed by a distance 322relative to a substantially planar upper surface of the substrate 102within the embedded memory region 302. In some embodiments, the uppersurface of the substrate 102 within the high voltage region 304 c mayalso be vertically depressed relative to upper surfaces of the substrate102 within the single-gate-dielectric region 304 a and thedual-gate-dielectric region 304 b. In some embodiments, the uppersurfaces of the substrate 102 within the single-gate-dielectric region304 a and the dual-gate-dielectric region 304 b may be substantiallyplanar to the upper surface of the substrate 102 within the embeddedmemory region 302.

Source/drain regions 310 are disposed within the single-gate well 308,the dual-gate well 314, and the high voltage well 320. In someembodiments, the source/drain regions 310 may have a second depth d₂that is greater than a first depth d₁ of the source/drain regions 206within the embedded memory region 302. In some embodiments, the controlgate electrode 220 a and the select gate electrode 220 b may comprise afirst material, while the single-gate-dielectric electrode 220 c, thedual-gate-dielectric electrode 220 d, and the high voltage gateelectrode 220 e may comprise different second material. In someembodiments, the first material is polysilicon and the second materialis a metal (e.g., titanium, tantalum, tungsten, copper, aluminum copper,or aluminum, etc.).

FIGS. 4A-4B illustrate some embodiments of an integrated chip having anarray of embedded flash memory cells.

FIG. 4A illustrates a cross-sectional view 400 of an integrated chiphaving an array of embedded flash memory cells. FIG. 4B illustrates atop-view 410 of the integrated chip of FIG. 4A. As shown incross-sectional view 400, the integrated chip comprises a memory region402 arranged within a substrate 102 at a location laterally separatedfrom a logic region 408. The memory region 402 comprises a plurality ofmemory cells 404 a-404 b arranged in an array, and respectively having acontrol gate 202 and a select gate 204. In some embodiments, the controlgates 202 may be arranged adjacent to one another. In such embodiments,the control gates 202 and the select gates 204 may share an interveningsource/drain region 206.

The logic region 408 comprises one or more transistor devices 236 (e.g.,single-gate-dielectric transistors, dual-gate-dielectric transistors,high voltage transistors, etc.). In some embodiments, the logic region408 may be separated from the memory cells 404 a-404 b by way of a dummyregion 406 having one or more select gates 204 that are not operated asmemory cells. In some embodiments, the dummy region 406 may be arrangedwithin the array structure of the memory region 402.

FIGS. 5-22 illustrate a series of cross-sectional views 500-2200 of someembodiments of a method for manufacturing an integrated chip comprisingan embedded flash memory cell. Although the cross-sectional-views shownin FIGS. 5-22 are described with reference to a method of forming anembedded flash memory cell, it will be appreciated that the structuresshown in the figures are not limited to the method of formation butrather may stand alone separate of the method.

As illustrated in cross-sectional view 500 of FIG. 5, a deep well 212 isformed within a substrate 102. The substrate 102 may be any type ofsemiconductor body (e.g., silicon, SiGe, SOI, etc.), such as asemiconductor wafer and/or one or more die on a wafer, as well as anyother type of semiconductor and/or epitaxial layers, associatedtherewith. In some embodiments, the deep well 212 may be formed byselectively implanting a dopant species 502 having a second doping typeinto the substrate 102 having a first doping type (e.g., an n-type deepwell may be formed within a p-type substrate, to form a PMOS activearea, by implanting a n-type dopant into the substrate). In someembodiments, the dopant species 502 may be selectively implanted intothe substrate 102 according to a first masking layer 504. In someembodiments, the first masking layer 504 may comprise a patternedphotoresist layer.

As illustrated in cross-sectional view 600 of FIG. 6, a plurality ofisolation regions 214 are formed within an upper side of a substrate102. In some embodiments, the plurality of isolation regions 214 may beformed by selectively etching the substrate 102 to form trenches andsubsequently filling the trenches with a dielectric material (e.g., anoxide).

As illustrated in cross-sectional view 700 of FIG. 7, one or more wells308, 210, 314, and/or 320 are formed within the substrate 102. The oneor more wells may comprise a select well 210, a single-gate well 308, adual-gate well 314, and a high voltage well 320. The one or more wells308, 210, 314, and/or 320 may be formed by selectively implanting one ormore dopant species 702 having the first doping type (using one or moreseparate implantation processes) into the substrate 102. In someembodiments, the one or more dopant species 702 may be selectivelyimplanted into the substrate 102 according to a second masking layer 704(e.g., a photoresist layer). In some embodiments, a sacrificialdielectric layer 706 may be formed over the substrate 102 prior to theimplantations to regulate a depth of the implantations.

As illustrated in cross-sectional view 800 of FIG. 8, a control well 208is formed within the substrate 102. The control well 208 may be formedby selectively implanting one or more dopant species 802 into thesubstrate 102 according to a third masking layer 804 (e.g., aphotoresist layer). In some embodiments, the control well 208 and theselect well 210 may comprise a same doping type and different dopingconcentrations.

As illustrated in cross-sectional view 900 of FIG. 9, a charge trappingdielectric structure 902 is formed over the substrate 102. In someembodiments, the charge trapping dielectric structure 902 comprises atunnel dielectric layer 902 a, a charge trapping layer 902 b formed overthe tunnel dielectric layer 902 a, and a blocking dielectric layer 902 cformed over the charge trapping layer 902 b. The tunnel dielectric layer902 a and the blocking dielectric layer 902 c may comprise an oxide(e.g., silicon dioxide), and the charge trapping layer 902 b maycomprise a nitride or nano-crystals (e.g., quantum dots). The tunneldielectric layer 902 a may be formed by a thermal growth process or byway of a deposition process (e.g., chemical vapor deposition (CVD),physical vapor deposition (PVD), and/or atomic layer deposition (ALD)),while the charge trapping layer 902 b and the blocking dielectric layer902 c may be formed by way of deposition processes (e.g., CVD, PVD,and/or ALD).

In some embodiments, the sacrificial dielectric layer 706 (as shown inFIG. 8) may be removed from over the control well 208 prior to formationof the charge trapping dielectric structure 902, but be kept in regionsoutside of the control well 208 (e.g., so that the charge trappingdielectric structure 902 is formed over the control well 208 and overthe sacrificial dielectric layer 706 in areas outside of the controlwell 208).

As illustrated in cross-sectional view 1000 of FIG. 10, a first chargetrapping dielectric etching process is performed to form an opening 1004in the charge trapping dielectric structure 1002. The opening 1004overlies the high voltage well 320. In some embodiments, the firstcharge trapping dielectric etching process may be performed byselectively exposing the charge trapping dielectric structure 1002 toone or more etchants 1006 according to a fourth masking layer 1008.

As illustrated in cross-sectional view 1100 of FIG. 11A, a high voltagegate dielectric layer 1102 is formed over the high voltage well 320within the substrate 102. In some embodiments, the high voltage gatedielectric layer 1102 is formed by a thermal growth process. The chargetrapping dielectric structure 1002 blocks (i.e., mitigates) the thermalgrowth process within an embedded memory region 302 comprising thecontrol well 208 and the select well 210. Blocking the thermal growthprocess within the embedded memory region 302 results in verticallyoffset surfaces between the high voltage well 320 and the embeddedmemory region 302, since a part of the substrate 102 over the highvoltage well 320 is consumed during the thermal growth process. Forexample, the substrate 102 may comprise an upper surface, overlying thehigh voltage well 320, which is recessed by a distance 1104 relative toa substantially planar upper surface within the embedded memory region302. In various embodiments, the thermal growth process may comprise awet thermal growth process or a dry thermal growth process.

Furthermore, since the charge trapping dielectric structure 1002 blocksthe thermal growth process within the embedded memory region 302 (e.g.,over the select gate well 210), thermal oxide encroachment and oxidationenhanced diffusion are reduced on the tunnel dielectric layer 1002 awithin the embedded memory region 302, resulting in a tunnel dielectriclayer having a relatively uniform thickness.

For example, FIG. 11C illustrates a top-view 1110 of the integrated chipof the memory region 302 shown in cross-sectional view 1100 (FIG. 11A isshown along cross-sectional line A-A′ of FIG. 11C extending along afirst direction 1109). FIG. 11B illustrates a cross-sectional view 1108of the integrated chip along a second direction 1111 (alongcross-sectional line B-B′ of FIG. 11C). As shown in cross-sectional view1108, and the graph 1112 of FIG. 11D, the tunnel dielectric layer 1002 ahas a thickness that decreases along the second direction 1111 as adistance from an isolation region 122 increases. The thicknesses of thetunnel dielectric layer 114 a may change by an amount 1114 less than 25%between the first thickness t₁ and the third thickness t₃.

The result of the reduction of oxidation encroachment on the tunneldielectric layer 1002 a also results in a substantially flat chargetrapping dielectric structure 1002 along the first direction 1109, asshown in cross-sectional view 1100. For example, while the chargetrapping dielectric structure 1002 may have higher outside corners, thecorners are elevated at a distance 1106 that is within a range ofbetween approximately 20% and approximately 50% of a height of thecharge trapping dielectric structure 1002 at a center (in contrast tosingle step charge trapping dielectric etching process which result incorners having birds peaks that are elevated in a range of betweenapproximately 100% and approximately 200% of a height at a center of thecharge trapping dielectric structure 1002).

As illustrated in cross-sectional view 1200 of FIG. 12, a second chargetrapping dielectric etching process is performed to remove the chargetrapping dielectric structure 114 in areas outside of the control well208. In some embodiments, the second charge trapping dielectric etchingprocess may be performed by selectively exposing the charge trappingdielectric structure 1206 to one or more etchants 1202 according to afifth masking layer 1204 (e.g., a photoresist layer) covering the chargetrapping dielectric structure 114 over the control well 208 and the highvoltage gate dielectric layer 1102 over the high voltage well 320.

As illustrated in cross-sectional view 1300 of FIG. 13, a dual-gatedielectric layer 1302 is formed over the substrate 102. The dual-gatedielectric layer 1302 may comprise an oxide (e.g., silicon dioxide). Insome embodiments, the dual-gate dielectric layer 1302 may be formed by ablanket deposition process (e.g., a CVD process, a PE-CVD process, a PVDprocess, or an ALD process). After formation, the dual-gate dielectriclayer 1302 is subsequently removed from over the single-gate well 308.In some embodiments, the dual-gate dielectric layer 1302 may be removedfrom over the single-gate well 308 by selectively exposing the dual-gatedielectric layer 1302 to one or more etchants 1304 according to a sixthmasking layer 1306 having an opening overlying the single-gate well 308.

As illustrated in cross-sectional view 1400 of FIG. 14, asingle-gate-dielectric layer 1402 is formed over the substrate 102. Thesingle-gate-dielectric layer 1402 may comprise an oxide (e.g., silicondioxide). In some embodiments, the single-gate-dielectric layer 1402 maybe formed by a blanket deposition process (e.g., a CVD process, a PE-CVDprocess, a PVD process, or an ALD process).

As illustrated in cross-sectional view 1500 of FIG. 15, a plurality ofgate electrodes 220 a-220 e are formed over the single-gate dielectriclayer 1402. The plurality of gate electrodes 220 a-220 e may be formedby depositing a conductive layer over the single-gate-dielectric layer1402 by way of a vapor deposition process (e.g., CVD, PVD, or ALD). Invarious embodiments, the conductive layer may comprise doped polysiliconor some other conductive material. The conductive layer may besubsequently etched to form a control gate electrode 220 a, a selectgate electrode 220 b, a single-gate-dielectric electrode 220 c, adual-gate-dielectric electrode 220 d, and a high voltage gate electrode220 e.

As illustrated in cross-sectional view 1600 of FIG. 16, thesingle-gate-dielectric layer and the dual-gate dielectric layer areselectively etched by exposing the single-gate-dielectric layer and thedual-gate dielectric layer to one or more etchants 1602 while using theplurality of gate electrodes 220 a-220 e as a mask. The etching processconfines the single-gate-dielectric layer and the dual-gate dielectriclayer below the control gate electrode 220 a, the select gate electrode220 b, the dual-gate-dielectric electrode 220 d, and the high voltagegate electrode 220 e. The etching process also confines thesingle-gate-dielectric layer below the single-gate-dielectric electrode220 c.

As illustrated in cross-sectional view 1700 of FIG. 17, a firstsource/drain implantation process is performed to form source/drainregions 310 within the single-gate well 308, the dual-gate well 314, andthe high voltage well 320. In some embodiments, the first source/drainimplantation process may be performed by selectively implanting a dopantspecies 1702 into the substrate 102 according to a mask comprising thesingle-gate-dielectric electrode 220 c, the dual-gate-dielectricelectrode 220 d, the high voltage gate electrode 220 e, and a seventhmasking layer 1704.

As illustrated in cross-sectional view 1800 of FIG. 18, one or moresidewalls spacers 224-226 are formed on opposing sides of the pluralityof gate electrodes 220 a-220 e. In some embodiments, the one or moresidewalls spacers 224-226 may comprise first sidewall spacers 224 andsecond sidewall spacers 226. The first sidewall spacers 224 and thesecond sidewall spacers 226 may respectively be formed by depositing anitride or oxide based material onto the substrate 102, and selectivelyetching the nitride or oxide based material to form the first sidewallspacer 224 and the second sidewall spacer 226.

As illustrated in cross-sectional view 1900 of FIG. 19, the chargetrapping dielectric structure 114 is selectively etched by exposing thecharge trapping dielectric structure 114 to one or more etchants 1902while using the control gate electrode 220 a, the one or more sidewallsspacers 224-226 surrounding the control gate electrode 220 a, and aneighth masking layer 1904 as a mask. The etching process confines thecharge trapping dielectric structure 114 below the control gateelectrode 220 a and the one or more sidewalls spacers 224-226surrounding the control gate electrode 220 a.

As illustrated in cross-sectional view 2000 of FIG. 20, a secondsource/drain implantation process is performed to form source/drainregions 206 within the control well 208 and the select well 210. In someembodiments, the second source/drain implantation process may beperformed by selectively implanting a dopant species 2002 into thesubstrate 102 according to the control gate electrode 220 a, the selectgate electrode 220 b, sidewall spacers 224-226 surrounding the controlgate electrode 220 a and the select gate electrode 220 b, and a ninthmasking layer 2004. In some embodiment, the second source/drainimplantation process may form source/drain regions 206 comprisinglightly doped source/drain regions having a shallower depth and a lowerdoping concentration than the source/drain regions 310 within thesingle-gate well 308, the dual-gate well 314, and the high voltage well320.

As illustrated in cross-sectional view 2100 of FIG. 21, the high voltagegate dielectric layer 318 is selectively etched by exposing the highvoltage gate dielectric layer 318 to one or more etchants 2102 whileusing the high voltage gate electrode 220 e, sidewalls spacers 224-226surrounding the high voltage gate electrode 220 e, and a tenth maskinglayer 2104 as a mask. The etching process confines the high voltage gatedielectric layer 318 below the high voltage gate electrode 220 e and thesidewalls spacers 224-226 surrounding the high voltage gate electrode220 e.

As illustrated in cross-sectional view 2200 of FIG. 22, an inter-leveldielectric (ILD) layer 228 is formed over the substrate 102. The ILDlayer 228 may comprise an oxide, PSG, a low κ dielectric, or some otherdielectric, and may be formed by vapor deposition process (e.g., CVD,PVD, or ALD). Conductive contacts 230 are formed within the ILD layer228. The conductive contacts 230 extend from a top surface of the ILDlayer 228 to the source/drain regions 206 and/or 310 and/or to thecontrol gate electrode 220 a, the select gate electrode 220 b, thesingle-gate-dielectric electrode 220 c, the dual-gate-dielectricelectrode 220 d, and/or the high voltage gate electrode 220 e. In someembodiments, the conductive contacts 230 may be formed by selectivelyetching the first ILD layer to form a plurality of openings. Theplurality of openings are subsequently filled with a conductive materialto form the plurality of conductive contacts. A planarization process(e.g., a chemical mechanical polishing process) may be performed afterforming the conductive material to co-planarize upper surfaces of theILD layer 228 and the third conductive layer. In various embodiments,the conductive material may comprise tungsten, copper, aluminum copper,or some other conductive material.

FIG. 23 illustrates a flowchart of some embodiments of a method 2300 offorming an integrated chip comprising a flash memory cell.

Although the disclosed methods (e.g., methods 2300 and 2400) aredescribed in relation to FIGS. 5-22, it will be appreciated that themethods are not limited to such structures. Furthermore, while thedisclosed methods are illustrated and described herein as a series ofacts or events, it will be appreciated that the illustrated ordering ofsuch acts or events are not to be interpreted in a limiting sense. Forexample, some acts may occur in different orders and/or concurrentlywith other acts or events apart from those illustrated and/or describedherein. In addition, not all illustrated acts may be required toimplement one or more aspects or embodiments of the description herein.Further, one or more of the acts depicted herein may be carried out inone or more separate acts and/or phases.

At 2302, a charge trapping dielectric structure is formed over a logicregion and an embedded memory region having control gate and select gateregions. FIG. 9 illustrates some embodiments of a cross-sectional view900 corresponding to act 2302.

At 2304, a first charge trapping dielectric etching process is performedto form an opening in the charge trapping dielectric structure over thelogic region. FIG. 10 illustrates some embodiments of a cross-sectionalview 1000 corresponding to act 2304.

At 2306, a thermal gate dielectric layer is formed over the logicregion. FIG. 11A illustrates some embodiments of a cross-sectional view1100 corresponding to act 2306.

At 2308, a second charge trapping dielectric etching process isperformed to remove the charge trapping dielectric structure from overthe select gate region. FIG. 12 illustrates some embodiments of across-sectional view 1200 corresponding to act 2308.

At 2310, one or more additional gate dielectric layers are formed overthe substrate. FIGS. 13-14 illustrate some embodiments ofcross-sectional views 1300-1400 corresponding to act 2310.

At 2312, a plurality of gate electrodes are formed over one or moreadditional gate dielectric layers. FIG. 15 illustrates some embodimentsof a cross-sectional view 1500 corresponding to act 2312.

At 2314, the charge trapping dielectric structure, the thermal gatedielectric layer, and the additional gate dielectric layers areselectively patterned using the plurality of gate electrodes as a mask.FIG. 16-21 illustrates some embodiments of cross-sectional views1600-2100 corresponding to act 2314.

At 2316, a plurality of conductive contacts are formed within an ILDlayer over the substrate. FIG. 22 illustrates some embodiments of across-sectional view 2200 corresponding to act 2316.

FIG. 24 illustrates a flowchart of some additional embodiments of amethod 2400 of forming an integrated chip comprising a flash memorycell.

At 2402, a deep well region may be formed within a substrate. FIG. 5illustrates some embodiments of a cross-sectional view 500 correspondingto act 2402.

At 2404, a plurality of isolation regions are formed within thesubstrate. FIG. 6 illustrates some embodiments of a cross-sectional view600 corresponding to act 2404.

At 2406, a plurality of well regions comprising a high voltage well, acontrol well, and a select well are formed within the substrate. FIGS.7-8 illustrate some embodiments of cross-sectional views 700-800corresponding to act 2406.

At 2408, a charge trapping dielectric structure is formed over theplurality of well regions. FIG. 9 illustrates some embodiments of across-sectional view 900 corresponding to act 2408.

At 2410, a first charge trapping dielectric etching process is performedto form an opening in the charge trapping dielectric structure over thehigh voltage well. FIG. 10 illustrates some embodiments of across-sectional view 1000 corresponding to act 2410.

At 2412, a high voltage gate dielectric layer is formed over the highvoltage well. FIG. 11 illustrates some embodiments of a cross-sectionalview 1100 corresponding to act 2410.

At 2414, a second charge trapping dielectric etching process isperformed to remove the charge trapping dielectric structure from overthe select well. FIG. 12 illustrates some embodiments of across-sectional view 1200 corresponding to act 2414.

At 2416, a first gate dielectric layer (e.g., a dual-gate-dielectriclayer) is formed over the substrate. FIG. 13 illustrates someembodiments of a cross-sectional view 1300 corresponding to act 2416.

At 2418, a second gate dielectric layer (e.g., a single-gate-dielectriclayer) is formed over the substrate. FIG. 14 illustrates someembodiments of a cross-sectional view 1400 corresponding to act 2418.

At 2420, a plurality of gate electrodes are formed over the second gatedielectric layer. FIG. 15 illustrates some embodiments of across-sectional view 1500 corresponding to act 2420.

At 2422, the second gate dielectric layer and the first gate dielectriclayer are selectively etched using the plurality of gate electrodes as amask. FIG. 16 illustrates some embodiments of a cross-sectional view1600 corresponding to act 2422.

At 2424, a first source/drain implantation process is performed to formsource/drain regions within the high voltage well. FIG. 17 illustratessome embodiments of a cross-sectional view 1700 corresponding to act2424.

At 2426, one or more sidewalls spacers are formed on opposing sides ofthe plurality of gate electrodes. FIG. 18 illustrates some embodimentsof a cross-sectional view 1800 corresponding to act 2426.

At 2428, the charge trapping dielectric structure is selectively etchedto confine the charge trapping dielectric structure below the controlgate electrode and the one or more sidewalls spacers. FIG. 19illustrates some embodiments of a cross-sectional view 1900corresponding to act 2428.

At 2430, a second source/drain implantation process is performed to formsource/drain regions within the control gate well and the select gatewell. FIG. 20 illustrates some embodiments of a cross-sectional view2000 corresponding to act 2430.

At 2432, the high voltage gate dielectric layer is selectively etched toconfine the high voltage gate dielectric layer below the high voltagegate electrode and the one or more sidewalls spacers. FIG. 21illustrates some embodiments of a cross-sectional view 2100corresponding to act 2432.

At 2434, a plurality of conductive contacts are formed within an ILDlayer over the substrate. FIG. 22 illustrates some embodiments of across-sectional view 2200 corresponding to act 2434.

Therefore, the present disclosure relates to a method of forming anembedded flash memory cell that uses a multi-step etching process toselectively etch a charge trapping dielectric structure in a manner thatsuppresses oxidation induced tunneling oxide encroachment and OED effectby blocking thermal oxide growth in a select gate region, therebyresulting in a tunnel dielectric layer having a relatively uniformthickness.

In some embodiments, the present disclosure relates to a method offorming an integrated chip. The method comprises forming a chargetrapping dielectric structure over a logic region, a control gateregion, and a select gate region within a substrate. A first chargetrapping dielectric etching process is performed to form an opening inthe charge trapping dielectric structure over the logic region. Athermal gate dielectric layer is formed within the opening. A secondcharge trapping dielectric etching process is performed to remove thecharge trapping dielectric structure over the select gate region. Aplurality of gate electrodes are formed over the thermal gate dielectriclayer and the charge trapping dielectric structure.

In other embodiments, the present disclosure relates a method of formingan integrated chip. The method comprises forming a high voltage well, acontrol well, and a select well within a substrate, and forming a chargetrapping dielectric structure over the high voltage well, the controlwell, and the select well. A first charge trapping dielectric etchingprocess is performed to form an opening in the charge trappingdielectric structure over the high voltage well. A high voltage gatedielectric layer is thermally grown over the high voltage well. A secondcharge trapping dielectric etching process is performed after thermallygrowing the high voltage gate dielectric layer to remove the chargetrapping dielectric structure over the select well.

In yet other embodiments, the present disclosure relates to anintegrated chip. The integrated chip comprises a control gate electrodeseparated from a substrate by way of a charge trapping dielectricstructure, and a select gate electrode separated from the substrate byway of one or more additional gate dielectric layers. The integratedchip further comprises a logic gate electrode separated from thesubstrate by way of a thermal gate dielectric layer. The substrate has afirst upper surface below the thermal gate dielectric layer, which isrecessed with respect to a substantially planar upper surface of thesubstrate below the control gate electrode and the select gateelectrode.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A method of forming an integrated chip,comprising: forming a charge trapping dielectric structure over a logicregion, a control gate region, and a select gate region within asubstrate; performing a first charge trapping dielectric etching processto form an opening in the charge trapping dielectric structure over thelogic region while leaving the charge trapping dielectric structureintact over the select gate region and over the control gate region;forming a thermal gate dielectric layer within the opening, wherein thecharge trapping dielectric structure is intact over the select gateregion and the control gate region during the formation of the thermalgate dielectric layer; performing a second charge trapping dielectricetching process to remove the charge trapping dielectric structure overthe select gate region; and forming a plurality of gate electrodes overthe thermal gate dielectric layer and the charge trapping dielectricstructure.
 2. The method of claim 1, wherein the charge trappingdielectric structure remaining after performing the first chargetrapping dielectric etching process mitigates formation of the thermalgate dielectric layer over the control gate region and the select gateregion.
 3. The method of claim 1, further comprising: forming one ormore additional gate dielectric layers over the substrate; forming theplurality of gate electrodes over the one or more additional gatedielectric layers; and patterning the charge trapping dielectricstructure, the thermal gate dielectric layer, and the one or moreadditional gate dielectric layers using the plurality of gate electrodesas a mask.
 4. The method of claim 3, wherein forming the one or moreadditional gate dielectric layers comprises: forming a first gatedielectric layer over the substrate; and forming a second gatedielectric layer over the first gate dielectric layer, wherein the firstgate dielectric layer has a greater thickness than the second gatedielectric layer.
 5. The method of claim 1, wherein forming the chargetrapping dielectric structure comprises: forming a tunnel dielectriclayer over the substrate; forming a charge trapping dielectric layerover the tunnel dielectric layer; and forming a blocking dielectriclayer over the charge trapping dielectric layer.
 6. The method of claim5, further comprising: forming first and second isolation regions withinthe substrate on opposing sides of the control gate region.
 7. Themethod of claim 6, wherein a thickness of the tunnel dielectric layervaries between the first and second isolation regions within a range ofbetween approximately 5% and approximately 25%.
 8. The method of claim1, wherein the substrate has a first upper surface below the thermalgate dielectric layer, which is recessed with respect to a substantiallyplanar upper surface of the substrate within the control gate region andthe select gate region.
 9. The method of claim 1, further comprising:forming a first plurality of source/drain regions within the logicregion; and subsequently forming a second plurality of source/drainregions within the control gate region and the select gate region.
 10. Amethod of forming an integrated chip, comprising: forming a high voltagewell, a control well, and a select well within a substrate; forming acharge trapping dielectric structure over the high voltage well, thecontrol well, and the select well, wherein the charge trappingdielectric structure comprises a tunnel barrier dielectric layer, acharge trapping dielectric layer, and a blocking dielectric layer;performing a first charge trapping dielectric etching process to form anopening in the charge trapping dielectric structure over the highvoltage well, wherein the first charge trapping dielectric etchingprocess is performed prior to formation of a conductive gate layer overthe control well; thermally growing a high voltage gate dielectric layerover the high voltage well, wherein the charge trapping dielectricstructure is intact over the control well and the select well during thethermally growing of the high voltage gate dielectric layer; andperforming a second charge trapping dielectric etching process, afterthermally growing the high voltage gate dielectric layer, to remove thecharge trapping dielectric structure over the select well.
 11. Themethod of claim 10, further comprising: forming a dual-gate dielectriclayer over the substrate after performing the second charge trappingdielectric etching process; forming a single-gate dielectric layer overthe dual-gate dielectric layer; forming a plurality of gate electrodesover the single-gate dielectric layer; and etching the dual-gatedielectric layer and the single-gate dielectric layer using theplurality of gate electrodes as masks.
 12. The method of claim 11,further comprising: forming one or more sidewall spacers on opposingsides of the plurality of gate electrodes.
 13. The method of claim 12,further comprising: using the plurality of gate electrodes and the oneor more sidewall spacers as masks to etch the high voltage gatedielectric layer and the charge trapping dielectric structure.
 14. Themethod of claim 10, further comprising: performing a first implantationprocess to form a first plurality of source/drain regions within thehigh voltage well; and performing a second implantation process to forma second plurality of source/drain regions within the control well andthe select well.
 15. A method of forming an integrated chip, comprising:forming a charge trapping dielectric structure over a logic region, acontrol gate region, and a select gate region of a substrate, whereinthe control gate region and the select gate region correspond to asingle flash memory cell; removing the charge trapping dielectricstructure from over a part of the logic region while leaving the chargetrapping dielectric structure intact over the select gate region andover the control gate region; forming a thermal gate dielectric layerover the logic region in a location from which the charge trappingdielectric structure was removed, wherein the charge trapping dielectricstructure is intact over the select gate region and the control gateregion during the formation of the thermal gate dielectric layer;removing the charge trapping dielectric structure from over the selectgate region after forming the thermal gate dielectric layer over thelogic region; and forming a logic gate electrode on the thermal gatedielectric layer and a control gate electrode on the charge trappingdielectric structure over the control gate region.
 16. The method ofclaim 15, wherein the substrate has a first upper surface below thethermal gate dielectric layer, which is recessed with respect to asubstantially planar upper surface of the substrate below the controlgate electrode.
 17. The method of claim 16, wherein the control gateregion is adjacent to the select gate region along a first direction;and wherein isolation structures are arranged within the substrate onopposing sides of the control gate region along a second direction thatis substantially perpendicular to the first direction.
 18. The method ofclaim 17, wherein the isolation structures respectively comprise adepressed region that is recessed below the substantially planar uppersurface of the substrate and a raised region that is elevated above thesubstantially planar upper surface of the substrate and that islaterally separated from the substrate by the depressed region.
 19. Themethod of claim 15, further comprising: patterning the thermal gatedielectric layer according to a first masking structure comprising thelogic gate electrode; and patterning the charge trapping dielectricstructure over the control gate region according to a second maskingstructure comprising the control gate electrode.
 20. The method of claim15, further comprising: forming an additional gate dielectric layer overthe select gate region after removing the charge trapping dielectricstructure from over the select gate region; forming a select gateelectrode on the additional gate dielectric layer over the select gateregion; and patterning the additional gate dielectric layer according toa third masking structure comprising the select gate electrode.